Transene Semiconductor and Microelectronics Materials
- Waxcut
- Waxstrip L2X
- Transene-100
- Transene Ultrasonic Detergent (TUD)
- Lab Glass Cleaner LGC-300
- Transene Glass Cleaner- 409
- Transene Flux Remover/Degreaser TFR220-DG
- Electroless Silicon Polish
- Polimet
- Polmet
- Sequestrox
- Ultrapure Water
- Gold/Silver Cleaner
- Tetramethylammonium hydroxide (TMAH)
- Pure Strip Sulfuric Acid-Peroxide Piranha Type Etch
Thin Film and Semiconductor Etchants
Junction Coatings
Micro Photoresist Materials
- KLT 6000 Etchant-Compatible Positive Photoresist
- KLT 5300 Etchant-Compatible Positive Photoresist
- HARE-SQ Negative Tone Photoresist
- TRANSIST Positive and Negative Photoresist Chemicals
- PKP-308PI Photoresist
- PKP II has been replaced by PKP-308PI
- NPD Negative Resist Developers
- Negative Resist Remover
- Negative Resist Chemicals
- Positive Resist Removers
- Photomask Coating
- Hexamethyldisilazane (HMDS)
- Solvents
- Positive Resist Developers
- Pure Strip Sulfuric Acid-Peroxide Piranha Type Etch
Macro Photoresist Materials
Macro Photoresist from Alpha Assembly
- 642
- KPR
- KPR 4
- KTFR has been replaced by PKP-308PI
- LPR-1
Developers, Strippers, and Thinners
- KPR Thinner
- KPR Developer
- KPR Dye Blue
- KPR 3/4 Developer
- PKP Thinner replaces KTFR Thinner
- PKP Developer replaces KTFR Developer
- LPR-1 Thinner
- LPR-1 Developer
- Stripper PRS-11
- Strippers KD, KS, No. 400, and 14-HS
- Strippers THP and GCS
- 1 F/A
- CD/3
- CSC
- CST
Mounting Wax and Cement
MIL Standard Solvents